Heterogeneous growth of continuous ZIF-8 films on low-temperature amorphous silicon
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DOI: 10.1016/j.apsusc.2018.12.060
Abstract: Abstract Thin amorphous silicon films, deposited at low temperature by Inductively Coupled Plasma Chemical Vapor Deposition, have, for the first time, been employed as substrate for ZIF-8 growth. In order to investigate the role of… read more here.
Keywords: zif; growth; zif films; temperature ... See more keywords