Effects of electrode materials on the performance of Zr0.75Hf0.25O2-based ferroelectric thin films via post deposition annealing
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DOI: 10.1088/1361-6528/acd199
Abstract: In this work, the effects of top electrode (TE) and bottom electrode (BE) on the ferroelectric properties of zirconia-based Zr0.75Hf0.25O2 (ZHO) thin films annealed by post-deposition annealing (PDA) are investigated in detail. Among W/ZHO/BE capacitors… read more here.
Keywords: post deposition; deposition annealing; thin films; zr0 75hf0 ... See more keywords